Our facility boasts a comprehensive array of tools, including advanced equipment for lithography, deposition, and etching. These capabilities enable the precise integration of nano-objects and nanomaterials, as well as the patterning of ultra-thin layers down to the nanometric scale. Designed with versatility in mind, the PTA accommodates substrates ranging from tiny 5 x 5 mm² samples to full 100 mm wafers - and upto  200 mm depending equipement process - while ensuring rigorous contamination control.

The PTA supports a broad spectrum of research areas—from nanoelectronics, MEMS & NEMS, magnetism, and spintronics to the integration of nanomaterials, nano-objects, and photonics. Our mission is twofold : to provide researchers with the cutting-edge tools and expertise needed to drive innovation, and to offer industrial partners a dynamic environment to develop their semiconductor projects.

Built on principles of flexibility, accessibility, and ease of use, the PTA is managed through a unique partnership that merges the complementary expertise of INAC CEA and LTM CNRS. This collaborative approach guarantees that users benefit from a state-of-the-art facility combined with tailored support, fostering an optimal setting for both pioneering research and industrial development.