Your technological partner

From proof of concept to small production

Logo PTA CEA CNRS MINATEC LETI
CEA CNRS UGA INP

Facilities - Equipements

Our plateform offers the technical capabilities needed to cover a wide range of projects in nanosciences, micro and nano technologies

Direct Write Laser Lithography (Heidelberg uPG 101)

Technical Details

Write Mode

Mode I II IV
Minimum Structure Size [μm] 0.6 1 5
Write Speed [mm2 /minute] 1 5 90
Address Grid [nm] 20 40 200
Edge Roughness [3σ,nm] 100 120 400
Line Width Uniformity [3σ,nm] 150 200 800
Aligment Measurement Accuracy [3σ,nm] 200 200 800

 Substrates up to 6“ x 6“

Structures down to 0.6 μm

Applications and Devices fabricated

Need more informations ?

15 + 1 =

PTA Grenoble

17 av. des Martyrs
38054 Grenoble

Call Us

(33) 4 38 78 20 05