Our facility boasts a comprehensive array of tools, including advanced equipment for lithography, deposition, and etching. These capabilities enable the precise integration of nano-objects and nanomaterials, as well as the patterning of ultra-thin layers down to the nanometric scale. Designed with versatility in mind, the PTA accommodates substrates ranging from tiny 5 x 5 mm² samples to full 100 mm wafers - and upto  200 mm depending equipement process - while ensuring rigorous contamination control.

The PTA supports a broad spectrum of research areas—from nanoelectronics, MEMS & NEMS, magnetism, and spintronics to the integration of nanomaterials, nano-objects, and photonics. Our mission is twofold: to provide researchers with the cutting-edge tools and expertise needed to drive innovation, and to offer industrial partners a dynamic environment to develop their semiconductor projects.

Built on principles of flexibility, accessibility, and ease of use, the PTA is managed through a unique partnership that merges the complementary expertise of INAC and LTM. This collaborative approach guarantees that users benefit from a state-of-the-art facility combined with tailored support, fostering an optimal setting for both pioneering research and industrial development.

How to use Our Facilities

At PTA, our platform is designed to empower advanced micro- and nano-fabrication projects with flexible project management solutions.

Direct Access
Engineers, researchers, technicians, students, and industry professionals can independently operate our state‑of‑the‑art cleanroom tools and execute the essential process steps. This model provides full hands-on engagement with our cutting‑edge facilities, allowing you to control every phase of your project.